10 Micrometer is formed by screen printing

Japanese Joint research group developed a new positive photoresist material and a succeeded in forming a wiring circuit with 10μm line width by screen printing the material. The members of the group are Osaka prefecture university , Nakanuma Art Screen Co Ltd and Industrial Technology Center of Wakayama prefecture. Right now, the demand for miniaturization and densification of electronic parts increased in mobile phones, digital cameras and other mobile devices. As a result, there is a growing demand for miniaturization of the wiring on electronis circuit boards. Wiring can be formed either by photolithography,ink jetting or screen printing. There is an increasing need for screen printing in view of cost and environmental load. The line width of the wiring that can be formed by the existing screen printing method is limited to 30μm. With the use of a screen plate on which a pattern with a line width of 10μm is formed, the group printed a silver paste on a polyimide substrate by sintering and produced a conductive circuit with a 10μm line width.